R-CURVE BEHAVIOR OF SINTERED SILICON-NITRIDE

被引:23
|
作者
KIM, YV [1 ]
MITOMO, M [1 ]
HIROSAKI, N [1 ]
机构
[1] NISSAN MOTOR CO LTD,NISSAN RES CTR,MAT RES LAB,YOKOSUKA,KANAGAWA 237,JAPAN
关键词
D O I
10.1007/BF00360707
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
R-curves for two in situ reinforced silicon nitrides A and B of different microstructures were determined by three different characterization methods. The saturated crack growth resistance was found to be 5.2, 7.2 and 9.2 MPa m(1/2) for silicon nitride A and 5.8, 8.0 and 10.0 MPa m(1/2) for silicon nitride B, respectively, by indentation, indentation-crack growth, and indentation-strength methods. The rising behaviour of R-curves was also found to depend on the characterization method. These results indicate that care should be taken in interpreting and utilizing R-curves, evaluated from different characterization methods a nd an R-curve characterization method with appropriate qualifiers is needed for rising R-curve materials.
引用
收藏
页码:4043 / 4048
页数:6
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