VACANCY INTERACTIONS IN SILICON

被引:48
|
作者
WOODBURY, HH
LUDWIG, GW
机构
关键词
D O I
10.1103/PhysRevLett.5.96
中图分类号
O4 [物理学];
学科分类号
0702 ;
摘要
引用
收藏
页码:96 / 97
页数:2
相关论文
共 50 条
  • [1] MOLECULAR-DYNAMICS STUDY OF THE VACANCY AND VACANCY-HYDROGEN INTERACTIONS IN SILICON
    PARK, YK
    ESTREICHER, SK
    MYLES, CW
    FEDDERS, PA
    PHYSICAL REVIEW B, 1995, 52 (03): : 1718 - 1723
  • [2] Ab initio calculations of As-vacancy interactions in silicon
    Xie, JJ
    Chen, SP
    PROCEEDINGS OF THE FIFTH INTERNATIONAL SYMPOSIUM ON PROCESS PHYSICS AND MODELING IN SEMICONDUCTOR TECHNOLOGY, 1999, 99 (02): : 165 - 174
  • [3] Coherent Interactions between Silicon-Vacancy Centers in Diamond
    Day, Matthew W.
    Bates, Kelsey M.
    Smallwood, Christopher L.
    Owen, Rachel C.
    Schroder, Tim
    Bielejec, Edward
    Ulbricht, Ronald
    Cundiff, Steven T.
    PHYSICAL REVIEW LETTERS, 2022, 128 (20)
  • [4] THE NEGATIVELY CHARGED VACANCY IN SILICON - HYPERFINE INTERACTIONS FROM ENDOR MEASUREMENTS
    SPRENGER, M
    MULLER, SH
    AMMERLAAN, CAJ
    PHYSICA B & C, 1983, 116 (1-3): : 224 - 229
  • [5] Hydrogen interactions with interstitial- and vacancy-type defects in silicon
    Tokmoldin, SZ
    Mukashev, BN
    Abdullin, KA
    Gorelkinskii, YV
    PHYSICA B-CONDENSED MATTER, 1999, 273-4 : 204 - 207
  • [6] Vacancy-vacancy interactions in NiAl
    Zacate, MO
    Collins, GS
    DIFFUSIONS IN MATERIALS: DIMAT2000, PTS 1 & 2, 2001, 194-1 : 383 - 388
  • [7] VACANCY AND VACANCY-HYDROGEN COMPLEXES IN SILICON
    ROBERSON, MA
    ESTREICHER, SK
    PHYSICAL REVIEW B, 1994, 49 (24): : 17040 - 17049
  • [8] Vacancy aggregates in silicon
    Hastings, JL
    Estreicher, SK
    Fedders, PA
    DEFECTS IN SEMICONDUCTORS - ICDS-19, PTS 1-3, 1997, 258-2 : 509 - 514
  • [9] VACANCY-VACANCY AND VACANCY-ELECTRON INTERACTIONS IN TIOX
    TERAUCHI, H
    COHEN, JB
    JOURNAL OF PHYSICS AND CHEMISTRY OF SOLIDS, 1978, 39 (06) : 681 - 686
  • [10] Vacancy aggregates in silicon
    Hastings, JL
    Estreicher, SK
    Fedders, PA
    PHYSICAL REVIEW B, 1997, 56 (16): : 10215 - 10220