THIN COPPER-FILMS BY PLASMA CVD USING COPPER-HEXAFLUORO-ACETYLACETONATE

被引:71
作者
OEHR, C
SUHR, H
机构
来源
APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING | 1988年 / 45卷 / 02期
关键词
D O I
10.1007/BF02565202
中图分类号
T [工业技术];
学科分类号
08 ;
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页码:151 / 154
页数:4
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