THIN COPPER-FILMS BY PLASMA CVD USING COPPER-HEXAFLUORO-ACETYLACETONATE

被引：71
作者：
OEHR, C
SUHR, H
机构：
来源：
APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING | 1988年 / 45卷 / 02期
关键词：
D O I：
10.1007/BF02565202
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
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页码：151 / 154
页数：4
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