QUANTITATIVE COMPARISON OF CONVERGENT-BEAM ELECTRON-DIFFRACTION (CBED) PATTERNS

The use of relative entropy as a measure of dissimilarity of two CBED patterns is proposed. It can be used in model testing by quantitatively comparing the experimental CBED with that calculated from the model. Models for which that relative entropy of the CBEDs per pattern pixel is beyond the level defined by the S/N of the system must be modified, since the dissimilarity of the patterns cannot be solely explained by the presence of noise. The relative entropy criterion has advantages over the correlation coefficient measurement, since the former takes into account the system noise.