WET-CHEMICAL ETCHING OF MN-ZN FERRITE BY FOCUSED AR+-LASER IRRADIATION IN H3PO4

被引：0
作者：
YONG, FL
TAKAI, M
NAGATOMO, S
NAMBA, S
机构：
[1] OSAKA UNIV,EXTREME MAT RES CTR,TOYONAKA,OSAKA 560,JAPAN
[2] DS SCANNER CO LTD,HIGASHI KU,OSAKA 540,JAPAN
来源：
APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING | 1988年 / 47卷 / 04期
关键词：
D O I：
暂无
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
引用
收藏
页码：319 / 325
页数：7
相关论文
共 8 条
[1]  
Born M, 1970, PRINCIPLES OPTICS, P36
[2]  
CRNONE C, 1986, APPL PHYS LETT, V48, P736
[3]   LASER-INDUCED CHEMICAL ETCHING OF CERAMIC PBTI1-XZRXO3 [J].
EYETT, M ;
BAUERLE, D ;
WERSING, W ;
LUBITZ, K ;
THOMANN, H .
APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, 1986, 40 (04) :235-239
[4]   EXCIMER-LASER-INDUCED ETCHING OF CERAMIC PBTI1-XZRXO3 [J].
EYETT, M ;
BAUERLE, D ;
WERSING, W ;
THOMANN, H .
JOURNAL OF APPLIED PHYSICS, 1987, 62 (04) :1511-1514
[5]   WAVE-GUIDING EFFECTS IN LASER-INDUCED AQUEOUS ETCHING OF SEMICONDUCTORS [J].
PODLESNIK, DV ;
GILGEN, HH ;
OSGOOD, RM .
APPLIED PHYSICS LETTERS, 1986, 48 (07) :496-498
[6]   THERMOCHEMICAL DRY ETCHING OF SINGLE-CRYSTAL FERRITE BY LASER IRRADIATION IN CCL4 GAS ATMOSPHERE [J].
TAKAI, M ;
LU, YF ;
KOIZUMI, T ;
NAMBA, S ;
NAGATOMO, S .
APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, 1988, 46 (03) :197-205
[7]  
TAKAI M, 1986, LASER PROCESSING DIA, V2, P57
[8]   LASER-CONTROLLED CHEMICAL ETCHING OF ALUMINUM [J].
TSAO, JY ;
EHRLICH, DJ .
APPLIED PHYSICS LETTERS, 1983, 43 (02) :146-148
1