INFLUENCE OF DEPOSITION TEMPERATURE ON COMPOSITION AND GROWTH-RATE OF GAASX P1-X LAYERS

被引:20
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BAN, VS
TIETJEN, JJ
GOSSENBE.HF
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10.1063/1.1661533
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O59 [应用物理学];
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页码:2471 / &
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[2]   PREPARATION OF GAASXP1-X BY VAPOR PHASE REACTION [J].
FINCH, WF ;
MEHAL, EW .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1964, 111 (07) :814-817
[3]  
RUEHRWEIN RA, 1968, AFMLTR68319 WRIGHT P
[4]   EPITAXIAL GAAS KINETIC STUDIES - (001)ORIENTATION [J].
SHAW, DW .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1970, 117 (05) :683-&
[5]   PREPARATION AND PROPERTIES OF VAPOR-DEPOSITED EPITAXIAL GAAS1-XPX USING ARSINE AND PHOSPHINE [J].
TIETJEN, JJ ;
AMICK, JA .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1966, 113 (07) :724-&
[6]   PREPARATION AND PROPERTIES OF VAPOR-DEPOSITED EPITAXIAL INAS1-XPX USING ARSINE AND PHOSPHINE [J].
TIETJEN, JJ ;
MARUSKA, HP ;
CLOUGH, RB .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1969, 116 (04) :492-&