MECHANISM OF ULTRAVIOLET AND ELECTRON BONDING OF PERFLUOROPOLYETHERS

被引:60
作者
VURENS, GH
GUDEMAN, CS
LIN, LJ
FOSTER, JS
机构
[1] IBM Research Division, Almaden Research Center, San Jose, California 95120-6099
关键词
D O I
10.1021/la00040a024
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
It has recently been reported that thin films of perfluoropolyethers (PFPE's) can be bonded to a variety of substrates under illumination of 185-nm ultraviolet (UV) light. In this paper we examine the bonding of thin perfluoropolyether films by low-energy electrons and UV light. It is shown that the bonding takes place through interaction of the perfluoropolyether molecule, with a low-energy photoelectron created by excitation of the substrate by the UV photons. The perfluoropolyether molecule subsequently undergoes a dissociative electron attachment, resulting in the formation of a radical and a F- ion. It is likely that radical propagation and termination steps then cross-link the polymer and attach it to the substrate. The similarities and differences between electron-bonded and UV-bonded perfluoropolyether films are discussed.
引用
收藏
页码:1165 / 1169
页数:5
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