INSITU MEASUREMENTS OF THE STRESS CHANGES IN THIN-FILM ELECTRODES

被引：20
作者：
SCARMINIO, J
SAHU, SN
DECKER, F
机构：
来源：
JOURNAL OF PHYSICS E-SCIENTIFIC INSTRUMENTS | 1989年 / 22卷 / 09期
关键词：
D O I：
10.1088/0022-3735/22/9/014
中图分类号：
TH7 [仪器、仪表];
学科分类号：
0804 ; 080401 ; 081102 ;
摘要：
引用
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页码：755 / 757
页数：3
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