NIAL UNDERLAYERS FOR COCRTA MAGNETIC THIN-FILMS

被引：74

作者：

LEE, LL ^{[1
]}

LAUGHLIN, DE ^{[1
]}

LAMBETH, DN ^{[1
]}

机构：

[1] CARNEGIE MELLON UNIV,CTR DATA STORAGE SYST,DEPT ELECT & COMP ENGN,PITTSBURGH,PA 15213

来源：

IEEE TRANSACTIONS ON MAGNETICS | 1994年 / 30卷 / 06期

基金：

美国国家科学基金会; 美国安德鲁·梅隆基金会;

关键词：

D O I：

10.1109/20.333954

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

CoCrTa films were sputter-deposited on either NiAl or Cr underlayers on glass substrates and their coercivities were compared. The NiAl film was found to have the B2 structure with a lattice parameter of similar to 0.288nm. The grain size of a 100nm NiAl film is similar to 15nm, which is about 50% smaller than a similarly deposited Cr film. As the CoCrTa/Cr films the CoCrTa/NiAl films show a similar increase of the in-plane coercivity with thickening of the underlayer. X-ray diffraction studies showed that CoCrTa/NiAl films have a stronger (1010) peak than CoCrTa/Cr films. Substrate heating and biasing during deposition of the NiAl underlayer are less helpful than in the case of Cr underlayer.

引用

页码：3951 / 3953

页数：3

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