APPLICATION OF NEUTRON TRANSMUTATION DOPING FOR PRODUCTION OF HOMOGENEOUS EPITAXIAL LAYERS

被引：7

作者：

PRUSSIN, S ^{[1
]}

CLELAND, JW ^{[1
]}

机构：

[1] OAK RIDGE NATL LAB,DIV SOLID STATE,OAK RIDGE,TN 37830

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1978年 / 125卷 / 02期

关键词：

D O I：

10.1149/1.2131446

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

页码：350 / 352

页数：3

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