EFFECT OF PRESSURE ON DIFFUSION OF IMPLANTED BORON IN SILICON

被引：0
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作者：
OKULICH, VI
VASIN, AS
PANTELEEV, VA
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来源：
FIZIKA TVERDOGO TELA | 1994年 / 36卷 / 02期
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中图分类号：
O469 [凝聚态物理学];
学科分类号：
070205 ;
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页码：534 / 536
页数：3
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