共 19 条
[1]
Ohmi, Shibata, Closed manufacturing system for advanced semiconductor manufacturing, Automated Integrated Circuits Manufacturing, PV91-5, pp. 3-64, (1991)
[2]
Morita, Ohmi, Hasegawa, Kawakami, Ohwada, Growth of native oxide on a silicon surface, J. Appl. Phys., 68, 3, pp. 1272-1281, (1990)
[3]
Toda, Shishido, Water transportation through a tunnel filled with nitrogen gas, Proc. 11th Int. on Contamination Control, pp. 173-183, (1992)
[4]
Inaba, IC auto-manufacturing system and neutralization of wafer charging in wafer transportation system, J. Jpn. Cleaning Assoc., 30, 2, pp. 108-121, (1992)
[5]
Ohmi, Inaba, Takenami, Research on adhesion of particles to charged wafers critical in contamination control, Microcontamination, 7, 10, pp. 29-32, (1989)
[6]
Ohmi, Inaba, Takenami, Research on adhesion of particles to charged wafers critical in contamination control, Microcontamination, 7, 10, pp. 86-97, (1989)
[7]
Inaba, Ohmi, Takenami, Particle adhesion to electro-statically-charged wafer, Proc: American Association for Aerosol Research, 1989 Annual Meeting, (1989)
[8]
Todokoro, Watanabe, Takenaka, Kishimoto, Kajiya, E-beam direct wafer writing process using water-soluble conductive layer (WSCL), Int. Electron Devices Meeting, pp. 753-756, (1987)
[9]
Namura, Okada, Naitoh, Todokoro, Inoue, Charge build up in magnetized process plasma, Jpn. J. Appl. Phys., 30, pp. 1576-1580, (1991)
[10]
Namura, Ishikawa, Aoki, Fukuzaki, Todokoro, Inoue, Evaluation of device charging in ion implantation, Jpn. J. Appl. Phys., 30, (1991)