SPECTROSCOPIC STUDY OF PLASMA-ENHANCED ORGANOMETALLIC CHEMICAL VAPOR-DEPOSITION FOR SUPERCONDUCTING THIN-FILM FORMATION

被引：11

作者：

EBIHARA, K ^{[1
]}

KANAZAWA, S ^{[1
]}

IKEGAMI, T ^{[1
]}

SHIGA, M ^{[1
]}

机构：

[1] KUMAMOTO TECH RES PK,DOJINDO LABS,KAMIMASHIKI,KUMAMOTO 86123,JAPAN

来源：

JOURNAL OF APPLIED PHYSICS | 1990年 / 68卷 / 03期

关键词：

D O I：

10.1063/1.346710

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Plasma-enhanced organometallic chemical vapor deposition process has been developed to prepare high Tc superconducting films. The volatile organic precursors of Y(fod)3, Ba(hfa)2, and Cu(hfa) 2 were decomposed with a microwave discharge plasma. Optical emission spectroscopy was used to determine the identity of the species produced during the vaporization and decomposition process. In this process, Y, Y+, Ba, Ba+, Cu, and Cu+ species were detected. After annealing in air, the films deposited on the (100) SrTiO3 substrate had preferential orientation of the crystalline c-axis perpendicular to the substrate surface. The characterization of this process is discussed comparing a hollow cathode YBaCuO plasma with the laser ablation experiments published.

引用

页码：1151 / 1156

页数：6

共 14 条

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