ELECTRICAL PROPERTIES OF RF SPUTTERED SILICON DIOXIDE FILMS

被引：0
|
作者：
KUSHNIR, AJ
机构：
来源：
JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1970年 / 117卷 / 08期
关键词：
D O I：
暂无
中图分类号：
O646 [电化学、电解、磁化学];
学科分类号：
081704 ;
摘要：
引用
收藏
页码：C257 / &
相关论文
共 50 条
  • [1] Structural and electrical properties of porous silicon with rf-sputtered Cu films
    Ansari, ZA
    Hong, K
    Lee, C
    MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY, 2002, 90 (1-2): : 103 - 109
  • [2] INVESTIGATION OF ELECTRICAL-CONDUCTION IN RF SPUTTERED SILICON DIOXIDE
    MOEENZIAI, B
    THIN SOLID FILMS, 1974, 22 (02) : S31 - S36
  • [3] Stress evaluation of RF sputtered silicon dioxide films for MEMS
    Bhatt, Vivekanand
    Chandra, Sudhir
    Kumar, Sushil
    Rauthan, C. M. S.
    Dixit, P. N.
    INDIAN JOURNAL OF PURE & APPLIED PHYSICS, 2007, 45 (04) : 377 - 381
  • [4] OBSERVATION OF DEFECTS IN RF SPUTTERED SILICON DIOXIDE GLASS FILMS
    CISTOLA, AB
    SOLID STATE TECHNOLOGY, 1972, 15 (12) : 36 - 40
  • [5] Electrical and structural properties of rapid thermal annealed RF sputtered silicon oxide films
    Microelectronics Laboratory, Department of Electrical Engineering, National University of Singapore, 10 Kent Ridge Crescent, Singapore 119260, Singapore
    不详
    Thin Solid Films, (108-110):
  • [6] Electrical and structural properties of rapid thermal annealed RF sputtered silicon oxide films
    Choi, WK
    Han, KK
    Chim, WK
    THIN SOLID FILMS, 1999, 343 : 108 - 110
  • [7] PROPERTIES OF RF SPUTTERED ALUMINUM OXIDE FILMS ON SILICON
    SALAMA, CAT
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1969, 116 (08) : C290 - &
  • [8] Effects of hydrogen and rf power on the structural and electrical properties of rf sputtered hydrogenated amorphous silicon carbide films
    Choi, WK
    Loo, FL
    Loh, FC
    Tan, KL
    JOURNAL OF APPLIED PHYSICS, 1996, 80 (03) : 1611 - 1616
  • [9] Effects of RF power and annealing on the electrical and structural properties of sputtered amorphous silicon carbide films
    Choi, WK
    Chong, NB
    Tan, LS
    Han, LJ
    MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY, 2000, 72 (2-3): : 132 - 134
  • [10] Electrical properties of thin rf sputtered aluminum oxide films
    Voigt, M
    Sokolowski, M
    MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY, 2004, 109 (1-3): : 99 - 103
12345