GAS PLASMA-ETCHING OF ION-IMPLANTED CHROMIUM FILMS

被引:23
作者
YAMAZAKI, T
SUZUKI, Y
NAKATA, H
机构
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1980年 / 17卷 / 06期
关键词
D O I
10.1116/1.570668
中图分类号
O59 [应用物理学];
学科分类号
摘要
引用
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页码:1348 / 1350
页数:3
相关论文
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