EARLY FORMATION OF CHEMICAL VAPOR-DEPOSITION DIAMOND FILMS

被引：148

作者：

IIJIMA, S

AIKAWA, Y

BABA, K

机构：

[1] Fundamental Research Laboratories, NEC Corporation, Tukuba 305, 34, Miyukigaoka

来源：

APPLIED PHYSICS LETTERS | 1990年 / 57卷 / 25期

关键词：

D O I：

10.1063/1.103812

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Nanometer-size diamond particles formed on a silicon substrate by the hot-filament chemical vapor deposition method were examined by a high-resolution electron microscope. The particles developed well-faceted cuboctahedral habits. Examination of their morphologies and microstructures provides a wealth of information on their crystal growth mechanism. The effect of the pretreatment of the substrate by diamond powder, which has been known to enhance thin-film growth, was found to be due to seeding by "diamond dust" on the substrate surface.

引用

页码：2646 / 2648

页数：3

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