SELF-ASSEMBLED MONOLAYER ELECTRON-BEAM RESIST ON GAAS

被引：143

作者：

TIBERIO, RC

CRAIGHEAD, HG

LERCEL, M

LAU, T

SHEEN, CW

ALLARA, DL

机构：

[1] CORNELL UNIV,NATL NANOFABRICAT FACIL,ITHACA,NY 14853

[2] PENN STATE UNIV,DEPT CHEM,UNIV PK,PA 16802

[3] PENN STATE UNIV,DEPT MAT SCI,UNIV PK,PA 16802

来源：

APPLIED PHYSICS LETTERS | 1993年 / 62卷 / 05期

关键词：

D O I：

10.1063/1.108938

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

We present results on electron beam exposure of a self-assembled monolayer film as a self-developing positive resist on GaAs. A 1.5 nm thick monolayer of n-octadecanethiol (C18H37SH) deposited on a GaAs (100) substrate showed a electron beam sensitivity of about 100 muC/cm2. The monolayer resist was used as a mask for chemical etching of the GaAs. Patterns in GaAs have been created with widths approximately equal to the exposing electron beam width of 50 nm.

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页码：476 / 478

页数：3

相关论文

共 11 条

[1] MOLECULAR-LEVEL CONTROL OVER SURFACE ORDER IN SELF-ASSEMBLED MONOLAYER FILMS OF THIOLS ON GOLD [J].

BAIN, CD ;

WHITESIDES, GM .

SCIENCE, 1988, 240 (4848) :62-63

[2] 10-NM LINEWIDTH ELECTRON-BEAM LITHOGRAPHY ON GAAS [J].

CRAIGHEAD, HG ;

HOWARD, RE ;

JACKEL, LD ;

MANKIEWICH, PM .

APPLIED PHYSICS LETTERS, 1983, 42 (01) :38-40

[3]

CRAIGHEAD HG, 1988, CURRENT TOPICS PHYSI

[4]

DOBISZ E, 1991, J VAC SCI TECHNOL B, V9, P2024

[5] DEEP UV PHOTOCHEMISTRY OF CHEMISORBED MONOLAYERS - PATTERNED COPLANAR MOLECULAR ASSEMBLIES [J].

DULCEY, CS ;

GEORGER, JH ;

KRAUTHAMER, V ;

STENGER, DA ;

FARE, TL ;

CALVERT, JM .

SCIENCE, 1991, 252 (5005) :551-554

[6] EXPERIMENTAL EVALUATION OF A SCANNING TUNNELING MICROSCOPE-MICROLENS SYSTEM [J].

MURAY, LP ;

STAUFER, U ;

BASSOUS, E ;

KERN, DP ;

CHANG, THP .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1991, 9 (06) :2955-2961

[7] FUNDAMENTAL-STUDIES OF THE CHEMISORPTION OF ORGANOSULFUR COMPOUNDS ON AU(111) - IMPLICATIONS FOR MOLECULAR SELF-ASSEMBLY ON GOLD SURFACES [J].

NUZZO, RG ;

ZEGARSKI, BR ;

DUBOIS, LH .

JOURNAL OF THE AMERICAN CHEMICAL SOCIETY, 1987, 109 (03) :733-740

[8] A NEW CLASS OF ORGANIZED SELF-ASSEMBLED MONOLAYERS - ALKANE THIOLS ON GAAS(100) [J].

SHEEN, CW ;

SHI, JX ;

MARTENSSON, J ;

PARIKH, AN ;

ALLARA, DL .

JOURNAL OF THE AMERICAN CHEMICAL SOCIETY, 1992, 114 (04) :1514-1515

[9]

SHEEN CW, UNPUB

[10] MOLECULAR MONOLAYERS AND FILMS [J].

SWALEN, JD ;

ALLARA, DL ;

ANDRADE, JD ;

CHANDROSS, EA ;

GAROFF, S ;

ISRAELACHVILI, J ;

MCCARTHY, TJ ;

MURRAY, R ;

PEASE, RF ;

RABOLT, JF ;

WYNNE, KJ ;

YU, H .

LANGMUIR, 1987, 3 (06) :932-950