ANOMALOUS BEHAVIOR OF N-CHANNEL MOS-TRANSISTOR CHARACTERISTICS IN THE TEMPERATURE-RANGE 4.2-14K

被引:8
|
作者
ROCOFYLLOU, E
NASSIOPOULOS, AG
TSAMAKIS, D
BALESTRA, F
机构
关键词
D O I
10.1016/0038-1101(89)90137-8
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
引用
收藏
页码:603 / 605
页数:3
相关论文
共 33 条
  • [1] N-CHANNEL MOSFET MODEL FOR THE 60-300-K TEMPERATURE-RANGE
    GILDENBLAT, GS
    HUANG, CL
    IEEE TRANSACTIONS ON COMPUTER-AIDED DESIGN OF INTEGRATED CIRCUITS AND SYSTEMS, 1991, 10 (04) : 512 - 518
  • [2] AN ACCURATE ENGINEERING MODEL OF AN N-CHANNEL MOSFET FOR 60-300 K TEMPERATURE-RANGE
    HUANG, CL
    GILDENBLAT, GS
    SOLID-STATE ELECTRONICS, 1990, 33 (10) : 1309 - 1318
  • [3] N-CHANNEL MOSFET CHARACTERISTICS FROM 4.2 TO 300-K
    NARITA, I
    OHSUGA, H
    MATSUMOTO, S
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1987, 134 (8B) : C426 - C426
  • [4] DISCHARGE CONDUCTIVITY OF R-MOS-TRANSISTOR IN (5...80)-K TEMPERATURE-RANGE
    PONOMAREV, AM
    PONOMAREV, MF
    IZVESTIYA VYSSHIKH UCHEBNYKH ZAVEDENII RADIOELEKTRONIKA, 1993, 36 (7-8): : 60 - 64
  • [5] LOW-TEMPERATURE BEHAVIOR OF CHANNEL TRANSIT-TIME CONSTANT IN MOS-TRANSISTOR
    SRIVASTAVA, A
    IEE PROCEEDINGS-G CIRCUITS DEVICES AND SYSTEMS, 1992, 139 (01): : 104 - 108
  • [6] MEASUREMENTS AND MODELING OF THE N-CHANNEL MOSFET INVERSION LAYER MOBILITY AND DEVICE CHARACTERISTICS IN THE TEMPERATURE-RANGE 60-300 K
    HUANG, CL
    GILDENBLAT, GS
    IEEE TRANSACTIONS ON ELECTRON DEVICES, 1990, 37 (05) : 1289 - 1300
  • [7] PARAELECTRIC BEHAVIOR OF DILUTE DIPOLE SYSTEMS IN TEMPERATURE-RANGE OF 0.025 TO 4.2K
    KNOP, K
    KANZIG, W
    HELVETICA PHYSICA ACTA, 1974, 46 (06): : 889 - 915
  • [8] ANOMALOUS EFFECTS ON THE CURRENT-VOLTAGE CHARACTERISTICS OF P-CHANNEL METAL-OXIDE-SEMICONDUCTOR TRANSISTORS IN THE TEMPERATURE-RANGE 4.2-50-K
    NASSIOPOULOS, AG
    TSAMAKIS, D
    ROCOFYLLOU, E
    JOURNAL OF APPLIED PHYSICS, 1990, 68 (04) : 1896 - 1901
  • [9] THE INVERSION LAYER OF SUBHALF-MICROMETER N-CHANNEL AND P-CHANNEL MOSFETS IN THE TEMPERATURE-RANGE 208-403-K
    WILDAU, HJ
    BERNT, H
    FRIEDRICH, D
    SEIFERT, W
    STAUDTFISCHBACH, P
    WAGEMANN, HG
    WINDBRACKE, W
    IEEE TRANSACTIONS ON ELECTRON DEVICES, 1993, 40 (12) : 2318 - 2325
  • [10] DEVICE FOR MEASURING ELASTICITY CHARACTERISTICS OF MATERIALS IN TEMPERATURE-RANGE 4.2-1000-DEGREES-K
    ALEKSYUK, MM
    VOLOSHCHENKO, AP
    PETRENKO, AI
    MUZYKA, NR
    PROKOPENKO, VN
    SAMGIN, VA
    INDUSTRIAL LABORATORY, 1977, 43 (02): : 294 - 296