CRYSTALLINE PERFECTION OF CHEMICAL VAPOR-DEPOSITED DIAMOND FILMS

被引：47

作者：

HETHERINGTON, AV

WORT, CJH

SOUTHWORTH, P

机构：

[1] Plessy Research Caswell Ltd, Towcester, Northants

来源：

JOURNAL OF MATERIALS RESEARCH | 1990年 / 5卷 / 08期

关键词：

Films--Chemical Vapor Deposition - Microscopic Examination--Transmission Electron Microscopy;

D O I：

10.1557/JMR.1990.1591

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

The crystalline perfection of microwave plasma assisted chemical vapor deposited (MPACVD) diamond films grown under various conditions has been examined by TEM. Most CVD diamond films thus far reported contain a high density of defects, predominantly twins and stacking faults on {111} planes. We show that under appropriate growth conditions, these planar defects are eliminated from the center of the crystallites, and occur only at grain boundaries where the growing crystallites meet. © 1990, Materials Research Society. All rights reserved.

引用

页码：1591 / 1594

页数：4