RUN BY RUN PROCESS-CONTROL - COMBINING SPC AND FEEDBACK-CONTROL

被引：219

作者：

SACHS, E ^{[1
]}

HU, A ^{[1
]}

INGOLFSSON, A ^{[1
]}

机构：

[1] SAN JOSE STATE UNIV,SAN JOSE,CA 95192

来源：

IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING | 1995年 / 8卷 / 01期

关键词：

D O I：

10.1109/66.350755

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

The Run by Run Controller provides a framework for controlling a process which is subject to disturbances such as shifts and drifts as a normal part of its operation. The Run by Run Controller combines the advantages of both Statistical Process Control (SPC) and Feedback Control. It has three components: Rapid Mode, Gradual Mode, and Generalized SPC. Rapid mode adapts to sudden shifts in the process such as those caused by maintenance operations. Gradual mode adapts to gradual drifts in the process such as those caused by build-up of deposition inside a reactor. The choice between the two modes is determined by the outcome from Generalized SPC which allows SPC to be applied to a process while it is being tuned. The Run by Run Controller has been applied to the control of a silicon epitaxy process in a barrel reactor. Rapid mode recovered the process within 3 runs after a disturbance. Gradual mode reduced the variation of the process by a factor of 2.7 as compared to historical data.

引用

页码：26 / 43

页数：18