STUDY ON CATALYTIC CHEMICAL VAPOR-DEPOSITION METHOD TO PREPARE HYDROGENATED AMORPHOUS-SILICON

被引：107
作者：
MATSUMURA, H
机构：
来源：
JOURNAL OF APPLIED PHYSICS | 1989年 / 65卷 / 11期
关键词：
D O I：
10.1063/1.343278
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
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页码：4396 / 4402
页数：7
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