SOFT-X-RAY PROJECTION LITHOGRAPHY

被引：16

作者：

CEGLIO, NM

HAWRYLUK, AM

STEARNS, DG

GAINES, DP

ROSEN, RS

VERNON, SP

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1990年 / 8卷 / 06期

关键词：

D O I：

10.1116/1.584912

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

Recent advances in x-ray optics have made possible the practical consideration of soft x-ray projection imaging for the fabrication of high density integrated circuits.

引用

页码：1325 / 1328

页数：4

共 7 条

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[4] REFLECTION MASK TECHNOLOGY FOR X-RAY PROJECTION LITHOGRAPHY [J].

HAWRYLUK, AM ;

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[5]

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[6]

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STEARNS D, COMMUNICATION

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