SYNCHROTRON RADIATION ASSISTED DEPOSITION OF CARBON-FILMS

被引：22
|
作者：
OHASHI, H
INOUE, K
SAITO, Y
YOSHIDA, A
OGAWA, H
SHOBATAKE, K
机构：
[1] SAGA UNIV,FAC SCI & ENGN,SAGA 840,JAPAN
[2] INST MOLEC SCI,OKAZAKI,AICHI 444,JAPAN
来源：
APPLIED PHYSICS LETTERS | 1989年 / 55卷 / 16期
关键词：
D O I：
10.1063/1.102225
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
引用
收藏
页码：1644 / 1646
页数：3
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