VOLTAGE SHIFTS AND IMPRINT IN FERROELECTRIC CAPACITORS

被引:206
作者
WARREN, WL
DIMOS, D
PIKE, GE
TUTTLE, BA
RAYMOND, MV
RAMESH, R
EVANS, JT
机构
[1] UNIV MARYLAND,DEPT MAT & NUCL ENGN,COLLEGE PK,MD 20742
[2] RADIANT TECHNOL INC,ALBUQUERQUE,NM 87106
关键词
D O I
10.1063/1.115531
中图分类号
O59 [应用物理学];
学科分类号
摘要
Voltage offsets in the polarization-voltage characteristics of Pb(Zr,Ti)O-3 capacitors can be induced by either thermal or optical processes. The thermally (optically) induced voltage shift occurs by heating (illuminating) the sample under remanence or a saturating bias. Generally speaking, the thermally induced voltage shifts are greater than those obtained optically; this is attributed to the role of oxygen vacancy-related defect dipoles throughout the film. We find that the inclusion of a dopant element that occupies a portion of the Ti(Zr) sites and has an oxidation state greater than +4 reduces the thermally induced voltage shifts observed in the capacitors. This may result because these particular dopants reduce the oxygen vacancy density and, hence, the defect-dipole contribution to the voltage shift. (C) 1995 American Institute of Physics.
引用
收藏
页码:866 / 868
页数:3
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