SPECTROSCOPIC ELLIPSOMETRY OF THIN COPPER-FILMS ON GLASS SUBSTRATES

被引：2

作者：

KAWAGOE, T

MIZOGUCHI, T

机构：

[1] Gakushuin University, Toshima-ku, Tokyo, 171

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS | 1993年 / 32卷 / 5A期

关键词：

THIN COPPER FILMS; INSITU ELLIPSOMETRY; DISCONTINUOUS STRUCTURE; ANISOTROPIC EFFECTIVE DIELECTRIC CONSTANT; PLASMA OSCILLATION; SEM OBSERVATION;

D O I：

10.1143/JJAP.32.2005

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

The complex reflectance ratio, rho=R(p)/R(s), for p- and s-polarized lights of copper island films with the mean mass thickness d(w) of 4 to 16 nm on glass substrates was measured in the visible region by means of in-situ ellipsometry. The observed wavelength dependence of rho was interpreted with the effective anisotropic continuous film model. The clear resonance peak of plasma oscillation in epsilon(x)'' was observed at E congruent-to 1.8 eV, which corresponded to the mean distance between the particles of 7.5 nm in the film of d(w)=4 nm. The estimated particle radius r was smaller by a factor of 10(-1) or 10(-2) than the island size directly observed by means of a scanning electron microscope.

引用

页码：2005 / 2009

页数：5