THEORETICAL TREATMENT OF CASCADE MIXING IN DEPTH PROFILING BY SPUTTERING

被引：81

作者：

HOFER, WO ^{[1
]}

LITTMARK, U ^{[1
]}

机构：

[1] UNIV COPENHAGEN,HC ORSTED INST,DK-2100 COPENHAGEN O,DENMARK

来源：

PHYSICS LETTERS A | 1979年 / 71卷 / 5-6期

关键词：

D O I：

10.1016/0375-9601(79)90635-2

中图分类号：

O4 [物理学];

学科分类号：

0702 ;

摘要：

An analytic expression for mixing in recoil cascades is discussed with particular emphasis on in-depth concentration profiling. Examples presented show that an asymmetric distortion is not necessarily a consequence of direct recoil implantation or an anisotropic velocity distribution. © 1979.

引用

页码：457 / 460

页数：4

共 12 条

[1] DEPTH RESOLUTION OF SPUTTER PROFILING [J].

ANDERSEN, HH .

APPLIED PHYSICS, 1979, 18 (02) :131-140

[2]

HEINEN H, 1964, Z ANGEW PHYS, V17, P356

[3] ELECTRONIC APERTURE FOR IN-DEPTH ANALYSIS OF SOLIDS WITH AN ION MICROPROBE [J].

HOFER, WO ;

LIEBL, H ;

ROOS, G ;

STAUDENMAIER, G .

INTERNATIONAL JOURNAL OF MASS SPECTROMETRY AND ION PROCESSES, 1976, 19 (03) :327-334

[4] DEPTH-PROFILING OF CU-NI SANDWICH SAMPLES BY SECONDARY ION MASS-SPECTROMETRY [J].

HOFER, WO ;

LIEBL, H .

APPLIED PHYSICS, 1975, 8 (04) :359-360

[5]

HOFKER WK, 1975, RAD EFF, V25, P206

[6]

ISHITANI T, 1975, APPL PHYS, V6, P241, DOI 10.1007/BF00883758

[7] MOMENTUM DEPOSITION BY HEAVY-ION BOMBARDMENT AND AN APPLICATION TO SPUTTERING [J].

LITTMARK, U ;

SIGMUND, P .

JOURNAL OF PHYSICS D-APPLIED PHYSICS, 1975, 8 (03) :241-245

[8] SUPER RANGES OF FAST IONS IN COPPER SINGLE CRYSTALS [J].

LUTZ, H ;

SIZMANN, R .

PHYSICS LETTERS, 1963, 5 (02) :113-114

[9]

Schulz F., 1973, Radiation Effects, V18, P211, DOI 10.1080/00337577308232124

[10] THEORY OF SPUTTERING .I. SPUTTERING YIELD OF AMORPHOUS AND POLYCRYSTALLINE TARGETS [J].

SIGMUND, P .

PHYSICAL REVIEW, 1969, 184 (02) :383-+

← 1 2 →