SCANNING ELECTRON-DIFFRACTION STUDY OF VAPOR-DEPOSITED AND ION-IMPLANTED THIN-FILMS OF GE (I)

被引：56

作者：

GRACZYK, JF ^{[1
]}

CHAUDHARI, P ^{[1
]}

机构：

[1] IBM CORP, THOMAS J WATSON RES CTR, YORKTOWN HTS, NY USA

来源：

PHYSICA STATUS SOLIDI B-BASIC SOLID STATE PHYSICS | 1973年 / 58卷 / 01期

关键词：

D O I：

10.1002/pssb.2220580116

中图分类号：

O469 [凝聚态物理学];

学科分类号：

070205 ;

摘要：

引用

页码：163 / 179

页数：17

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