OXYGEN DEPTH PROFILING IN THIN-FILMS USING THE O-16 (HE-3, ALPHA) O-15 NUCLEAR-REACTION

被引：2

作者：

DWORSCHAK, RG ^{[1
]}

LAURSEN, T ^{[1
]}

WHITTON, JL ^{[1
]}

机构：

[1] QUEENS UNIV,DEPT PHYS,KINGSTON K7L 3N6,ONTARIO,CANADA

来源：

VACUUM | 1991年 / 42卷 / 13期

关键词：

D O I：

10.1016/0042-207X(91)90109-V

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

There has been recent interest in the O-16(He-3, alpha)O-15 nuclear reaction analysis (NRA) technique to study oxygen in thin films [Abel et al, Nucl Instrum Meth, B45, 100 (1990); Lennard et al, Nucl Instrum Meth, B43, 187 (1989)] as an alternative to the O-16(d, alpha)N-14 reaction. We demonstrate that the depth resolution of the He-3 technique can be made comparable with that of the deuterium. An advantage of the He-3 technique is that it is not associated with neutron production as is the deuterium reaction.

引用

页码：785 / 788

页数：4

共 12 条

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