TEMPERATURE-DEPENDENCE OF X-RAY REFLECTION INTENSITY FROM AN ABSORBING PERFECT CRYSTAL NEAR AN ABSORPTION-EDGE

被引：14
作者：
KAWAMURA, T [1 ]
FUKAMACHI, T [1 ]
机构：
[1] SAITAMA INST TECHNOL,DEPT ELECT ENGN,SAITAMA 36902,JAPAN
来源：
ACTA CRYSTALLOGRAPHICA SECTION A | 1979年 / 35卷 / SEP期
关键词：
D O I：
10.1107/S0567739479001881
中图分类号：
O6 [化学];
学科分类号：
0703 ;
摘要：
[No abstract available]
引用
收藏
页码：831 / 835
页数：5
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