OPTICAL-ABSORPTION OF CU IMPLANTED SILICA

The extinction coefficient (EC) per ion was measured over the spectral range from 1.8 to 6.2 eV for a series of Cu ion implanted silica substrates. The substrates were implanted with nominal doses ranging from 0.3 to 12.0 X 10(16) ions/cm2 at substrate temperatures of 100, 296 and 673 K. The EC was observed to increase for both increasing dose and substrate temperature. The absorption in the spectral region < 5.0 eV is attributed to the formation of spherical and oblate spheroidal colloids. At spectral energies > 5.0 eV, the absorption is attributed to radiation damage effects.