FORMATION OF IRON SILICIDE THIN-FILMS

被引：33

|

作者：

ZHU, QG

IWASAKI, H

WILLIAMS, ED

PARK, RL

机构：

来源：

JOURNAL OF APPLIED PHYSICS | 1986年 / 60卷 / 07期

关键词：

D O I：

10.1063/1.337136

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

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页码：2629 / 2631

页数：3

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