REFLECTIVE SYSTEMS-DESIGN STUDY FOR SOFT-X-RAY PROJECTION LITHOGRAPHY

被引:29
作者
JEWELL, TE [1 ]
RODGERS, JM [1 ]
THOMPSON, KP [1 ]
机构
[1] OPT RES ASSOCIATES,PASADENA,CA 91107
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1990年 / 8卷 / 06期
关键词
D O I
10.1116/1.585108
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
We have investigated several all-reflective designs which have potential application for soft x-ray projection lithography. The resolution goal for all designs was 0.1-mu-m or better. Different design aspects including usable field size, distortion, obscuration, number of mirrors, surface shape (spherical versus aspheric), and system packaging were explored. Trade-off studies were made between three types of systems: strip field scanning systems, and large field nonscanning systems with both curved and flat mask. Several candidate unobscured designs with 0.1-mu-m resolution are presented.
引用
收藏
页码:1519 / 1523
页数:5
相关论文
共 18 条
[1]  
Abel I. R., 1980, Proceedings of the Society of Photo-Optical Instrumentation Engineers, V237, P271
[2]  
BURCH CR, 1947, P PHYS SOC LOND, V59, P41, DOI 10.1088/0959-5309/59/1/308
[3]  
Ceglio N M, 1989, J Xray Sci Technol, V1, P7, DOI 10.3233/XST-1989-1103
[4]   MANUFACTURE OF A 3-MIRROR WIDE-FIELD OPTICAL-SYSTEM [J].
EGDALL, IM .
OPTICAL ENGINEERING, 1985, 24 (02) :285-289
[5]   SOFT-X-RAY PROJECTION LITHOGRAPHY USING AN X-RAY REDUCTION CAMERA [J].
HAWRYLUK, AM ;
SEPPALA, LG .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1988, 6 (06) :2162-2166
[6]  
ISCHIHARA S, 1989, J VAC SCI TECHNOL B, V7, P1652
[7]  
JEWELL TE, IN PRESS P SPIE
[8]   SOFT-X-RAY REDUCTION LITHOGRAPHY USING MULTILAYER MIRRORS [J].
KINOSHITA, H ;
KURIHARA, K ;
ISHII, Y ;
TORII, Y .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1989, 7 (06) :1648-1651
[9]  
Marechal A, 1947, REV OPTIQUE, V26, P257
[10]   MICROGAP CONTROL IN X-RAY NANOLITHOGRAPHY [J].
MOEL, A ;
SCHATTENBURG, ML ;
CARTER, JM ;
SMITH, HI .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1989, 7 (06) :1692-1695