FABRICATION OF GRAPHITE CRYSTALS DUE TO ION-BEAM SPUTTERING FOR THE OBSERVATION OF HIGH-RESOLUTION IMAGES

被引：0
|
作者：
HOJOU, K
NAKATANI, T
OIKAWA, T
SHINO, M
KANAYA, K
机构：
[1] KOGAKUIN UNIV,TOKYO 160,JAPAN
[2] JEOL LTD,AKISHIMA,TOKYO 196,JAPAN
来源：
JOURNAL OF ELECTRON MICROSCOPY | 1981年 / 30卷 / 03期
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中图分类号：
TH742 [显微镜];
学科分类号：
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页码：235 / 236
页数：2
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