HIGH-RATE DEPOSITION OF TRANSPARENT CONDUCTING FILMS BY MODIFIED REACTIVE PLANAR MAGNETRON SPUTTERING OF CD2SN ALLOY

被引：41

作者：

MANIV, S ^{[1
]}

MINER, C ^{[1
]}

WESTWOOD, WD ^{[1
]}

机构：

[1] BELL NO RES,OTTAWA K1Y 4H7,ONTARIO,CANADA

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1981年 / 18卷 / 02期

关键词：

D O I：

10.1116/1.570722

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：195 / 198

页数：4

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