ULTRAHIGH MAGNETIC-FIELD STUDY OF KONDO-TYPE ZERO-BIAS CONDUCTANCE PEAK IN MAGNETICALLY DOPED METAL-INSULATOR-METAL TUNNEL-JUNCTIONS

被引：21

作者：

BERMON, S ^{[1
]}

PARASKEVOPOULOS, DE ^{[1
]}

TEDROW, PM ^{[1
]}

机构：

[1] MIT,FRANCIS BITTER NATL MAGNET LAB,CAMBRIDGE,MA 02139

来源：

PHYSICAL REVIEW B | 1978年 / 17卷 / 05期

关键词：

D O I：

10.1103/PhysRevB.17.2110

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：2110 / 2123

页数：14

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