PULSED ION SOURCES FOR SURFACE MODIFICATION OF MATERIALS

被引：11

作者：

KORENEV, S

机构：

[1] Joint Institute for Nuclear Research, Dubna

来源：

NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS | 1993年 / 80-1卷 / pt 2期

关键词：

D O I：

10.1016/0168-583X(93)96115-S

中图分类号：

TH7 [仪器、仪表];

学科分类号：

0804 ; 080401 ; 081102 ;

摘要：

A series of pulsed ion sources, working on the basis of explosive ion emission, used for surface modification of different materials is described in this report. The ion sources consist of a vacuum diode and a high-voltage pulse generator. The pulse duration of the ion current t(p) is 0.1-10.0 mus and the kinetic energies of the ions from conducting materials (C, Cu, Nb, Ti, Mo and others) are between 2 and 600 keV. Emission characteristics of these ion sources are discussed.

引用

页码：242 / 245

页数：4