Particle nucleation and growth in a low-pressure argon-silane discharge

被引:288
作者
Boufendi, L. [1 ]
Bouchoule, A. [1 ]
机构
[1] Univ Orleans, UFR Sci, URA 831, Grp Rech Energet Milieux Ionises,CNRS, F-45067 Orleans 02, France
关键词
D O I
10.1088/0963-0252/3/3/004
中图分类号
O35 [流体力学]; O53 [等离子体物理学];
学科分类号
070204 ; 080103 ; 080704 ;
摘要
The growth of particle size has been measured in a low-pressure argon-silane plasma using nigh-resoltion transmssion electronic microscopy. The results show that formation and growth of dust particles is an homogeneous process; the first generation size distribution is monodispersed; and the growth kinetics reveals a three-step process from molecular ions to large panicles. Together with measurements of particle concentration obtained by laser light scattering, these measurements give a clear indication that the growth proceeds through three successive steps: (1) 'rapid' formation of crystalline clusters (as shown by dark-field high-resolution transmission electron microscopy) with concentrations of LP to 10(10) cm(-3); (ii) formation of aggregates, of diameters up to 50nm, by coagulation (during coagulation the particle concentration decreases dramatically); and (iii) growth of the panicles with a constant concentration by surface deposition of SiH(x) radicals, whilst the numerical density remains constant. Laser-induced particle explosive evaporation has been performed using a XeCl (308 nm) laser. This experiment allowed detection of nanocrystallites and also the beginning of their coagulation and gave clear evidence of the temperature effect on particle formation.
引用
收藏
页码:262 / 267
页数:6
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