BORON REDISTRIBUTION IN SINTERED ALPHA-SIC DURING THERMAL-OXIDATION

被引:20
作者
COSTELLO, JA [1 ]
TRESSLER, RE [1 ]
TSONG, IST [1 ]
机构
[1] PENN STATE UNIV,MAT RES LAB,UNIVERSITY PK,PA 16802
关键词
D O I
10.1111/j.1151-2916.1981.tb10298.x
中图分类号
TQ174 [陶瓷工业]; TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
引用
收藏
页码:332 / 335
页数:4
相关论文
共 17 条
[1]   MODELS FOR COMPUTER-SIMULATION OF COMPLETE IC FABRICATION PROCESS [J].
ANTONIADIS, DA ;
DUTTON, RW .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 1979, 26 (04) :490-500
[2]   BORON SEGREGATION AT SI-SIO2 INTERFACE AS A FUNCTION OF TEMPERATURE AND ORIENTATION [J].
COLBY, JW ;
KATZ, LE .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1976, 123 (03) :409-412
[3]   OXIDATION-KINETICS OF HOT-PRESSED AND SINTERED ALPHA-SIC [J].
COSTELLO, JA ;
TRESSLER, RE .
JOURNAL OF THE AMERICAN CERAMIC SOCIETY, 1981, 64 (06) :327-331
[4]   KINETICS OF OXIDATION OF HOT-PRESSED SILICON-NITRIDE CONTAINING MAGNESIA [J].
CUBICCIOTTI, D ;
LAU, KH .
JOURNAL OF THE AMERICAN CERAMIC SOCIETY, 1978, 61 (11-1) :512-517
[5]   THERMAL OXIDATION OF HEAVILY DOPED SILICON [J].
DEAL, BE ;
SKLAR, M .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1965, 112 (04) :430-+
[6]   THEORY AND DIRECT MEASUREMENT OF BORON SEGREGATION IN SIO2 DURING DRY, NEAR DRY, AND WET O2 OXIDATION [J].
FAIR, RB ;
TSAI, JCC .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1978, 125 (12) :2050-2058
[7]   DIFFUSIVITY SUMMARY OF B, GA, P, AS, AND SB IN SIO2 [J].
GHEZZO, M ;
BROWN, DM .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1973, 120 (01) :146-148
[8]   REDISTRIBUTION OF ACCEPTOR + DONOR IMPURITIES DURING THERMAL OXIDATION OF SILICON [J].
GROVE, AS ;
SAH, CT ;
LEISTIKO, O .
JOURNAL OF APPLIED PHYSICS, 1964, 35 (09) :2695-&
[9]   ANALYTIC CORRECTION OF EDGE EFFECTS IN ION-BEAM SPUTTERED DEPTH PROFILES [J].
HOFFMAN, DW ;
TSONG, IST ;
POWER, GL .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1980, 17 (02) :613-620
[10]   IMPURITY REDISTRIBUTION DURING SILICON EPITAXIAL-GROWTH AND SEMICONDUCTOR-DEVICE PROCESSING [J].
LANGER, PH ;
GOLDSTEIN, JI .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1974, 121 (04) :563-571