DEPOSITION OF VANADIUM-OXIDE FILMS BY DIRECT-CURRENT MAGNETRON REACTIVE SPUTTERING

被引：45
|
作者：
KUSANO, E [1 ]
THEIL, JA [1 ]
THORNTON, JA [1 ]
机构：
[1] UNIV ILLINOIS,COORDINATED SCI LAB,URBANA,IL 61801
来源：
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1988年 / 6卷 / 03期
关键词：
D O I：
10.1116/1.575304
中图分类号：
TB3 [工程材料学];
学科分类号：
0805 ; 080502 ;
摘要：
引用
收藏
页码：1663 / 1667
页数：5
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