GROWTH AND STRUCTURE OF COPPER-FILMS ON (0001) RUTHENIUM SURFACES

被引:41
作者
CHRISTMANN, K
ERTL, G
SHIMIZU, H
机构
[1] Institut für Physikalische Chemie der Universität München
关键词
D O I
10.1016/0040-6090(79)90158-5
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
The structural and electronic properties of clean evaporated copper films on (0001) Ru surfaces were studied by low energy electron diffraction, Auger electron spectroscopy and thermal desorption and work function measurements. Two-dimensional epitaxial growth and three-dimensional epitaxial growth are clearly discernible from extra" spots in the low energy electron diffraction patterns and from Auger spectroscopy as well as from thermal desorption measurements which show the formation of two states β1 and β2. The β2 state is identified as arising from two-dimensional copper growth and is almost saturated after the deposition of about 5 × 1014 Cu atoms cm-2; the β1 state is caused by the three-dimensional growth of copper. The binding energies of the two states were evaluated from the maximum desorption temperatures; we found that the binding energy of β2 exceeds that of β1 (which is identical with the sublimation energy of copper) by about 3-4 kcal mol-1. The work function increases up to 800 meV; an intermediate maximum indicates a small charge transfer from ruthenium to copper. © 1979."
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页码:247 / 252
页数:6
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