SPECTROSCOPIC DIAGNOSTICS OF CF4-O2 PLASMAS DURING SI AND SIO2 ETCHING PROCESSES

被引：300

作者：

DAGOSTINO, R

CRAMAROSSA, F

DEBENEDICTIS, S

FERRARO, G

机构：

来源：

JOURNAL OF APPLIED PHYSICS | 1981年 / 52卷 / 03期

关键词：

D O I：

10.1063/1.329748

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：1259 / 1265

页数：7

共 25 条

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