SUBMICROMETER MOSFET STRUCTURE FOR MINIMIZING HOT-CARRIER GENERATION

被引:113
作者
TAKEDA, E
KUME, H
TOYABE, T
ASAI, S
机构
关键词
D O I
10.1109/T-ED.1982.20752
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
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页码:611 / 618
页数:8
相关论文
共 19 条
[1]   HOT-CARRIER INSTABILITY IN IGFETS [J].
ABBAS, SA ;
DOCKERTY, RC .
APPLIED PHYSICS LETTERS, 1975, 27 (03) :147-148
[2]  
ANTONIADIS DA, 1978, 50192 STANF EL LAB T
[3]  
ASAI S, 1974, J VAC SCI TECHNOL, V16, P1710
[4]   HOT-ELECTRON EMISSION IN N-CHANNEL IGFETS [J].
COTTRELL, PE ;
TROUTMAN, RR ;
NING, TH .
IEEE JOURNAL OF SOLID-STATE CIRCUITS, 1979, 14 (02) :442-455
[5]   DESIGN OF ION-IMPLANTED MOSFETS WITH VERY SMALL PHYSICAL DIMENSIONS [J].
DENNARD, RH ;
GAENSSLEN, FH ;
YU, HN ;
RIDEOUT, VL ;
BASSOUS, E ;
LEBLANC, AR .
IEEE JOURNAL OF SOLID-STATE CIRCUITS, 1974, SC 9 (05) :256-268
[6]   SIZE EFFECTS IN E-BEAM FABRICATED MOS DEVICES [J].
ELLIOTT, MT ;
SPLINTER, MR ;
JONES, AB ;
REEKSTIN, JP .
IEEE JOURNAL OF SOLID-STATE CIRCUITS, 1979, 14 (02) :391-397
[7]   THRESHOLD-VOLTAGE INSTABILITY IN MOSFETS DUE TO CHANNEL HOT-HOLE EMISSION [J].
FAIR, RB ;
SUN, RC .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 1981, 28 (01) :83-94
[8]  
KAMIGAKI Y, UNPUB N CHANNEL MOSF
[9]  
Koyanagi M., 1979, JPN J APPL PHYS S, V18
[10]   1 MU-M MOSFET VLSI TECHNOLOGY .4. HOT-ELECTRON DESIGN CONSTRAINTS [J].
NING, TH ;
COOK, PW ;
DENNARD, RH ;
OSBURN, CM ;
SCHUSTER, SE ;
YU, HN .
IEEE JOURNAL OF SOLID-STATE CIRCUITS, 1979, 14 (02) :268-275