Electrical conduction and recrystallization in thin Pb films deposited at low temperatures

被引：6
作者：
Armi, EL
机构：
[1] CALTECH, Norman Bridge Lab Phys, Pasadena, CA USA
[2] CALTECH, Cryogen Lab, Pasadena, CA USA
来源：
PHYSICAL REVIEW | 1943年 / 63卷 / 11/12期
关键词：
D O I：
10.1103/PhysRev.63.451
中图分类号：
O4 [物理学];
学科分类号：
0702 ;
摘要：
引用
收藏
页码：0451 / 0454
页数：4
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