TSC MEASUREMENTS OF COUPLED LEVELS IN ION-IMPLANTED SI

被引：3
|
作者：
LUDMAN, J
ROOSILD, S
VICKERS, V
机构：
来源：
JOURNAL OF ELECTRONIC MATERIALS | 1978年 / 7卷 / 04期
关键词：
D O I：
10.1007/BF02655417
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
引用
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页码：535 / 546
页数：12
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