PLANAR SURFACE BURIED-HETEROSTRUCTURE INGAASP/INP LASERS WITH HYDRIDE VPE-GROWN FE-DOPED HIGHLY RESISTIVE CURRENT-BLOCKING LAYERS

被引:16
作者
SUGOU, S
KATO, Y
NISHIMOTO, H
KASAHARA, K
机构
关键词
SEMICONDUCTING INDIUM COMPOUNDS - Growth;
D O I
10.1049/el:19860832
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
The fabrication and lasing characteristics for planar surface buried-heterostructure InGaAsP/InP lasers with highly resistive current-blocking layers are reported. Embedding growth was successfully performed by Fe-doping hydride VPE. Single transverse mode operation has been realized in lasers with a narrow active region, without any nonradiative recombination increase, due to an Fe-associated deep level. High-frequency response up to 10 GHz was also demonstrated.
引用
收藏
页码:1214 / 1215
页数:2
相关论文
共 5 条
[1]   SELECTIVE GROWTH OF INP BURIED STRUCTURE BY CHLORIDE VAPOR-PHASE EPITAXY [J].
HOSHINO, M ;
TANAKA, K ;
KOMENO, J ;
KITAHARA, K ;
KODAMA, K ;
OZEKI, M .
APPLIED PHYSICS LETTERS, 1986, 48 (02) :186-188
[2]   GROWTH OF FE-DOPED SEMI-INSULATING INP BY MOCVD [J].
LONG, JA ;
RIGGS, VG ;
JOHNSTON, WD .
JOURNAL OF CRYSTAL GROWTH, 1984, 69 (01) :10-14
[3]  
MILLER BI, 1985, P OFC 86, P37
[4]   VAPOR-PHASE GROWTH OF INGAASP-INP DH STRUCTURES BY THE DUAL-GROWTH-CHAMBER METHOD [J].
MIZUTANI, T ;
YOSHIDA, M ;
USUI, A ;
WATANABE, H ;
YUASA, T ;
HAYASHI, I .
JAPANESE JOURNAL OF APPLIED PHYSICS, 1980, 19 (02) :L113-L116
[5]   SEMI-INSULATOR-EMBEDDED INGAASP/INP FLAT-SURFACE BURIED HETEROSTRUCTURE LASER [J].
TANAKA, K ;
HOSHINO, M ;
WAKAO, K ;
KOMENO, J ;
ISHIKAWA, H ;
YAMAKOSHI, S ;
IMAI, H .
APPLIED PHYSICS LETTERS, 1985, 47 (11) :1127-1129