VAPOR GROWTH-MECHANISM OF A CRYSTAL-SURFACE COVERED WITH A QUASI-LIQUID LAYER EFFECT OF SELF-DIFFUSION COEFFICIENT OF THE QUASI-LIQUID LAYER ON THE GROWTH-RATE
被引:19
作者:
KURODA, T
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机构:Institute of Low Temperature Science, Hokkaido University, Sapporo
KURODA, T
机构:
[1] Institute of Low Temperature Science, Hokkaido University, Sapporo