PHOTODEGRADATION OF POLYSILANES STUDIED BY FAR-INFRARED SPECTROSCOPY

被引：4

作者：

WATANABE, A ^{[1
]}

ITO, O ^{[1
]}

MATSUDA, M ^{[1
]}

SUEZAWA, M ^{[1
]}

SUMINO, K ^{[1
]}

机构：

[1] TOHOKU UNIV,INST MAT RES,AOBA KU,SENDAI,MIYAGI 980,JAPAN

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | 1994年 / 33卷 / 7A期

关键词：

PHOTODEGRADATION; POLYSILANE; POLY(METHYLPHENYLSILYLENE); POLY(PHENYLSILYNE); POLY(METHYLPHENYLSILYLENE COPHENYLSILYNE)S; FAR-INFRARED SPECTROSCOPY;

D O I：

10.1143/JJAP.33.4133

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

The photodegradation of polysilanes was investigated by far-infrared spectroscopy. The band intensity of asymmetric and symmetric Si-Si stretching vibration of poly(methylphenylsilylene) was decreased by UV-irradiation. The formation of the Si-branching structure in the UV-irradiated poly(methylphenylsilylene) was suggested. Poly-(phenylsilyne) showed stability of the Si rings during the photodegradation.

引用

页码：4133 / 4134

页数：2

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