DEPTH OF FOCUS AND THE MOMENT EXPANSION

被引:8
作者
WANG, YT
PATI, YC
KAILATH, T
机构
[1] Information Systems Laboratory, Stanford University, Stanford, CA
关键词
D O I
10.1364/OL.20.001841
中图分类号
O43 [光学];
学科分类号
070207 ; 0803 ;
摘要
We introduce the so-called moment expansion of a defocused image as a tool for analyzing and improving the depth of focus in optical imaging. It is shown that a number of previously noted defocus phenomena can be readily derived or explained in terms of moment expansion. Some potential applications of the moment expansion to phase-shifting mask and pupil filter design for optical lithography are also briefly noted. (C) 1995 Optical Society of America
引用
收藏
页码:1841 / 1843
页数:3
相关论文
共 8 条
[1]  
Goodman J., 2005, INTRO FOURIER OPTICS
[2]   IMPROVING RESOLUTION IN PHOTOLITHOGRAPHY WITH A PHASE-SHIFTING MASK [J].
LEVENSON, MD ;
VISWANATHAN, NS ;
SIMPSON, RA .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 1982, 29 (12) :1828-1836
[3]  
LIU Y, 1992, P SOC PHOTO-OPT INS, V1674, P14, DOI 10.1117/12.130308
[4]   PHASE-SHIFTING MASKS FOR MICROLITHOGRAPHY - AUTOMATED DESIGN AND MASK REQUIREMENTS [J].
PATI, YC ;
KAILATH, T .
JOURNAL OF THE OPTICAL SOCIETY OF AMERICA A-OPTICS IMAGE SCIENCE AND VISION, 1994, 11 (09) :2438-2452
[5]  
PATI YC, 1994, P SOC PHOTO-OPT INS, V2197, P314, DOI 10.1117/12.175426
[6]  
VONBUNAU RM, 1995, THESIS STANFORD U ST
[7]   2X2-PHASE MASK FOR ARBITRARY PATTERN-FORMATION [J].
WATANABE, H ;
PATI, YC ;
PEASE, RF .
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1994, 33 (12B) :6790-6795
[8]  
Wilson T, 1984, THEORY PRACTICE SCAN