PULSED PLASMA DEPOSITION OF LEAD LANTHANUM ZIRCONATE TITANATE(PLZT) AND LEAD LANTHANUM TITANATE(PLT)

Thin films of ferroelectric lanthanum-modified lead zirconate titanate (PLZT) and lanthanum-modified lead titanate (PLT) have been prepared using a novel high-powered pulsed plasma deposition technique. This method uses a microwave-induced intense discharge in a low pressure gas containing organometallic precursors of each of the required metal atoms, together with carbon dioxide and argon. In the discharge, the precursors dissociate to produce atoms which then recombine on the substrate to form the oxide film. Results are presented on the composition and crystal form of the films as the deposition conditions are varied. By careful control of deposition temperature, it is shown that a microcrystalline perovskite phase may be grown on a wide variety of substrate materials.