RAPID THERMAL ANNEALING OF YBACUO FILMS ON SI AND SIO2 SUBSTRATES

被引:23
作者
ASLAM, M
SOLTIS, RE
LOGOTHETIS, EM
AGER, R
MIKKOR, M
WIN, W
CHEN, JT
WENGER, LE
机构
[1] FORD MOTOR CO,RES STAFF,DEARBORN,MI 48121
[2] WAYNE STATE UNIV,DEPT PHYS,DETROIT,MI 48202
关键词
D O I
10.1063/1.100578
中图分类号
O59 [应用物理学];
学科分类号
摘要
引用
收藏
页码:153 / 155
页数:3
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